Etch & Deposition Power Systems

FAQ

• Will my system still need a matchbox?

  No, our technologies are optimized to function with non-50 Ohm loads and therefore can be fit directly at the electrode. Because of this optimization, reflected power as they existed with matchboxes do not pose a risk to our system reliability or efficiency.

• Do your technologies basically integrate matchboxes?

  No, our technologies do not require any variable components to ensure reliable power, voltage or current delivery across varying plasma conditions.

• Have prodrives technologies been tested on real plasma chambers and will it work on my chamber (Inductively coupled, Capactively coupled etc)?

  Prodrive Technologies has worked with various research partners and customers to integrate and test the technologies on various plasma chambers including various source and electrode types.

• Can Prodrive customize output connectors to suit existing plasma chambers?

  Yes - Prodrive commonly works together with customers to integrate systems close to the application area.

• Can output specifications (frequency, power, voltage etc) be changed to my chamber needs?

  Yes, our systems are commonly optimized to specific situations. Based on the chamber needs we also offer optimized system control solutions.

• Can your technologies be used for both the plasma generation and biasing?

  The Tailored Waveform Generator technology is designed for plasma biasing (IEDF control) only but the Instant Plasma Generator can be used for both biasing and plasma generation.

• Where will the products be located on the plasma chambers?

  The products are designed to be in close proximity to the plasma chamber, aiming to fit in either the existing matchbox footprint or close to it.