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Tailored waveform generator - Axiom

Tailored bias waveform generator for dissociated plasma ion energy and density control during etching and deposition.

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As semiconductor devices continue to scale, plasma etching and deposition processes require tighter control over ion energy and plasma density. Maintaining that control is essential for achieving smaller features and stable process performance.

Prodrive Technologies developed the tailored waveform generator - Axiom for advanced plasma biasing in etch and deposition applications. It enables tailored bias waveforms to support more accurate process control while helping reduce system complexity.

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  • Flexible waveform control

    All waveform parameters (duty cycle, timing, voltages, slopes) can be varied.

  • Single box solution

    Control only a single box instead of multiple subsystems and remove slow and unpredictable matchboxes.

  • High system efficiency

    Achieve higher etch or deposition rates with lower power.

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Features

  • Flexible digital waveform control
  • Programmable duty cycle
  • Built-in high speed oscilloscope
  • EtherCAT interface
  • Common Exciter Interface (CEX)
  • ON/OFF modulation
  • No matchbox required
  • Integrated DC-blocking capacitor

Benefits

  • Improved process control, lower damage

    Obtain optimal IEDF control by adjusting the waveform parameters with lower wafer damage.

  • Reduced system complexity

    Remove matchboxes, matchbox controllers and other external sensors by using a single box solution.

  • Reduce process drift

    Control of the waveform directly on the electrode enables lower process drift compared to matchbox RF biasing solutions.

  • Enhanced system effiency

    Improved etch rates and selectivity compared to RF biasing.

Application areas

  • Plasma deposition

    Plasma deposition
  • Flat Panel Display processing

    Flat panel display processing
  • Plasma Cleaning

    Plasma cleaning
  • Plasma Dicing

    Plasma dicing
  • Plasma etching

    Plasma etching

Markets & industries

  • Semiconductor

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    Image processing and defect classification

  • Flat panel display

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    Components and solutions for LED, LCD, DLP, plasma and LCD displays

Product specifications

Process targets
Ion energy Up to 1000eV
Ion current Up to 700 mA
Electrical performance
Input External +400V / +24V Supply
Vprocess 20 - 1500V
Vp-p Vprocess + Vslope 20 - 2000V
Islope 2.1A
Tperiod 3.33 - 10 us
Environmental
Ambient temperature 15 to 35°C
Cooling Air cooled
Environment Laboratory / Controlled
Interfaces
Phase Common exciter
Synchronization Synchronization (CEX)
Configuration / Monitoring Ethernet (Toolsuite) / EtherCAT
Enabling / Disabling I/O
Customization
Customization is fully possible. Please contact us for further discussion.

Let’s find the right fit!

Whether you’re ready to order or need a solution built around your requirements, we’re here to help you move forward

Let's discuss your needs